Publications

• Characterization of mechnical properties of VO2 thin films on sapphire and silicon by ultra-microindentation
  P. Jin, S. Nakao, S. Tanemura, T. Bell, L. S. Wielunski, M. V. Swain: Thin Solid Films, 343-344(1999)134.
• Growth of samarium monosulfide thin films by co-sputtering deposition
  P. Jin, M. Tazawa, J-F. Huang and S. Tanemura: J. Cryst. Growth, 191(1998)285.
• High-energy W ion implantation into VO2 thin film
  P. Jin, S. Nakao and S. Tanemura: Nuclear Inst .& Methods in Physics Research B, 141(1998)419.
• Tungsten doping into vanadium dioxide thermochromic films by high-energy ion implantation and thermal annealing
  P. Jin, S. Nakao and S. Tanemura: Thin Solid Films 324(1998)151.
• Micro-indentation measurements of glass carbon implanted with high-energy titanium ions
  S. Nakao, K. Saito, M. Ikeyama, H. Niwa, S. Tanemura, Y. Miyagawa, S. Miyagawa, P. Jin,
  T. Bell, S. Wielonski, M. Swain : Surf. & Coat. Technol. (1998) in printing .
• Optical constents of V1-xWxO2 films
  M. Tazawa, P. Jin, S. Tanemura: Applied Optics (1998) in printing.
• Dependence of microstructure and thermochromism on substrate temperature for sputter-deposited VO2 epitaxial films
  P. Jin, K. Yoshimura, S. Tanemura: J. Vac. Sci. Technol. (1997) 1113.
• V1-xMoxO2 thermochromic films deposited by reactive magnetron sputtering
  P. Jin and S. Tanemura: Thin Solid Films, 281-282(1996)239.
• Thin film used to obtain a constant temperature lower than the ambient
  M. Tazawa, P. Jin and S. Tanemura: Thin Solid Films, 281-282(1996)232.
• Relationship between transition temperature and x in V1-xWxO2 films
  deposited by dual-target magnetron sputtering
  P. Jin and S. Tanemura: Jpn. J. Appl. Phys. 34 (1995) 2459-2460.
• Researches in NIRIN on metal-doped VO2 films for advanced thermochromic window coatings
  P. Jin, K. Yoshimura and S. Tanemura: Proc. Window innovations'95, (1995)481-488.
• The formation of V1-xWxO2 thermochromic films by reactive magnetron sputtering with an alloy target
  P. Jin, K. Yoshimura, S. Iwama and S. Tanemura: Proc. SPIE 2531 (1995) 51-59.
• Evaluation of porosity and composition in reactively rf sputtered Ti1-xZrxN films
  P. Jin, S. Nakao, S. Tanemura and S. Maruno: Thin Solid Films, 271(1995)19-25
• Formation and thermochromism of VO2 films deposited by rf magnetron
  sputtering at low temperature
  P. Jin and S. Tanemura: Jpn. J. Appl. Phys. 33 (1994) pp.1478-1483.
• Effect of reactive gas on the formation of fullerenes
  Y. Tai, M. Tazawa, J. Murakami, P. Jin, T. Miki, K. Inukai and T. Osaki: Extended Abstracts of the 55th Meeting of NIRIN (1994)154-156
• Preparation of metal-doped thermochromic VO2 films for smart window coatings
  P. Jin, M. Tazawa, T. Miki and S. Tanemura: Trans. Mat. Res. Soc. Jpn., Volume 18a, (1994) pp.533-536.
• Thermochromism of metal-doped VO2 films deposited by dual-target sputtering
  P. Jin, M. Tazawa, K. Yoshimura, T. Miki, K. Igarashi and S. Tanemura: Proc.SPIE 2255(1994)415-422.
• Computational design of SiO based spectral selective radiating film
  M. Tazawa, P. Jin, Y. Tai, T. Miki, K. Yoshimura and S. Tanemura: Proc.SPIE 2255(1994)149-159.
• Preparation and microstructure of reactively sputtered Ti1-xZrxNy films
  I. Sakamoto, P. Jin and S. Maruno: Thin Solid Films 228(1993)169-172
• Thermal expansion of K1-xNbxZr2-x(PO4)3
  T. Ota, P. Jin and I. Yamai: J. Mater. Sci. Let. 12(1993)1348-1349
• Bias effect on the microstructure and diffusion barrier capability of sputtered TiN and TiOxNy films
  P. Jin and S. Maruno: Jpn. J. Appl. Phys. 31 (1992) 1446-1452.
• Evaluation of internal stress in reactively sputter-deposited ZrN thin films
  P. Jin and S. Maruno: Jpn. J. Appl. Phys. 30 (1991) 1463-1468.
• Stress relaxation in reactively sputter-deposited TiOxNy films
  P. Jin and S. Maruno: Jpn. J. Appl. Phys. 30 (1991) 2058-2062.

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